Normal view MARC view ISBD view

Principles of chemical vapor deposition:

Dobkin, Daniel M.

Principles of chemical vapor deposition: what's going on inside the reactor Daniel M. Dobkin and Michael K. Zuraw. - Netherland : Kluwer Academic Publishers, 2003.

ISBN: 1402012489

Subjects--Topical Terms:
Refractory coating.
Vapor-plating.
Machinery.
Chemical engineering.

Dewey Class. No.: 671.735 P935

Print
Add to your cart (remove)
Save record
BIBTEX Dublin Core MARCXML MARC (non-Unicode/MARC-8) MARC (Unicode/UTF-8) MARC (Unicode/UTF-8, Standard) MODS (XML) RIS
More searches

Search for this title in:
Other Libraries (WorldCat) Other Databases (Google Scholar) Online Stores (Bookfinder.com) Open Library (openlibrary.org)