| 000 | 00705nam a2200217Ia 4500 | ||
|---|---|---|---|
| 003 | OSt | ||
| 005 | 20160830115820.0 | ||
| 008 | 130919s9999 xx 000 0 und d | ||
| 020 | _a1402012489 | ||
| 040 |
_aIISER Bhopal _cTBS |
||
| 082 | 0 | 0 | _a671.735 P935 |
| 100 | 1 |
_aDobkin, Daniel M. _92788 |
|
| 245 | 1 | 0 |
_aPrinciples of chemical vapor deposition: _bwhat's going on inside the reactor _cDaniel M. Dobkin and Michael K. Zuraw. |
| 260 |
_aNetherland : _bKluwer Academic Publishers, _c2003. |
||
| 650 | 0 |
_aRefractory coating. _914430 |
|
| 650 | 0 |
_aVapor-plating. _914431 |
|
| 650 | 0 |
_aMachinery. _914432 |
|
| 650 | 0 |
_aChemical engineering. _914433 |
|
| 700 | 1 |
_aZuraw, Michael K. _914434 |
|
| 942 |
_cREF _2ddc |
||
| 999 |
_c1033 _d1033 |
||