| 000 | 00772nam a2200241Ia 4500 | ||
|---|---|---|---|
| 003 | OSt | ||
| 005 | 20160830174350.0 | ||
| 008 | 130919s9999 xx 000 0 und d | ||
| 020 | _a9781402075438 | ||
| 040 |
_aIISER Bhopal _cLBD |
||
| 082 | 0 | 0 | _a621.38152P |
| 100 | 1 |
_aBarnat, Edward V. _92866 |
|
| 245 | 1 | 0 |
_aPulsed and pulsed bias sputtering principles and applications _cEdward V. Barnat and Toh-Ming Lu. |
| 260 |
_aMassachusetts : _bKluwer Academic Publishers, _c2003. |
||
| 300 | _ax, 155 p. | ||
| 650 | 0 |
_aOptical materials. _914567 |
|
| 650 | 0 |
_aThin films. _914568 |
|
| 650 | 0 |
_aCathode sputtering-Plating process. _914569 |
|
| 650 | 0 |
_aPolymers. _914570 |
|
| 650 | 0 |
_aPhysical organic chemistry. _914571 |
|
| 700 | 1 |
_aLu, Toh-Ming. _914572 |
|
| 942 |
_cREF _2ddc |
||
| 999 |
_c1131 _d1131 |
||