Principles of chemical vapor deposition: what's going on inside the reactor Daniel M. Dobkin and Michael K. Zuraw.
Publication details: Netherland : Kluwer Academic Publishers, 2003.ISBN:- 1402012489
- 671.735 P935
| Item type | Current library | Collection | Call number | Copy number | Status | Notes | Date due | Barcode | |
|---|---|---|---|---|---|---|---|---|---|
Books
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Central Library, IISER Bhopal | Reference | 671.735 P935 (Browse shelf(Opens below)) | 1 | Not For Loan | Reserve | 2749 |
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| 660.299503EN19 Encyclopedia of catalysis | 660.6 B388B2 Biotechnology: | 660.6078 AL41P Practical manual of biotechnology | 671.735 P935 Principles of chemical vapor deposition: | 808.0666R141T Technical communication: | 891.43 G141Y Yugnayak Vivekanand ( युगनायक विवेकानन्द) | 891.43 V645 Vivekanand sahitya ( विवेकानन्द साहित्य ) |
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