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Principles of chemical vapor deposition: what's going on inside the reactor Daniel M. Dobkin and Michael K. Zuraw.

By: Contributor(s): Publication details: Netherland : Kluwer Academic Publishers, 2003.ISBN:
  • 1402012489
Subject(s): DDC classification:
  • 671.735 P935
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Holdings
Item type Current library Collection Call number Copy number Status Notes Date due Barcode
Books Books Central Library, IISER Bhopal Reference 671.735 P935 (Browse shelf(Opens below)) 1 Not For Loan Reserve 2749

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